Photolithographic filters are used in applications with LSI and LCD
steppers in which high-power mercury vapor lamps are used for
illumination. The very narrow-band bandpass filters produce an almost
monochromatic radiation. This allows the best possible resolution to be
achieved in the target.
Laser Components' partner Omega Optical has revised its i-line bandpass
filters. The filter designs are now available based on dual magnetron
reactive sputtering coating. This significantly improves both the
intensity of the i-line and its homogeneity in the photolithographic
process.
There is one new product from Omega that is particularly interesting
for MEMS production: MicroChem, the manufacturer of the SU-8 photo
resist, recommends UV radiation below 350 nm to be blocked in order to
produce particularly perpendicular structures. With this in mind, the
PL-360-LP from the mask aligner series can be particularly recommended!
More Information
http://www.lasercomponents.com/
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